沉积温度(deposition temperature)、生长物质的碰撞速率(impinging rate of growth species)是两个最重要的影响因素： 单晶薄膜生长：
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most optimatic deposition temperature 最佳生长温度
low temperature vapor deposition 低温汽相淀积
high temperature chemical vapor deposition 高温化学汽相淀积
low temperature deposition 能在低温下成长 ; 低温沉积
low temperature deposition test engine 低温沉积试验发动机
low temperature physical deposition 低温物理沉积
low temperature deposition techniques 低温合成技术
The result shows that the nano-crystalline diamond film has a higher transmission and a smoother surface at deposition temperature of 640℃and gas pressure of 2.5kPa.
结果表明，在沉积温度为640℃、沉积气压为2．5kPa条件下，可实现高透过率的、光滑的纳米金刚石薄膜。
参考来源 - CVD金刚石薄膜在光电器件中的应用研究The influence of deposition temperature on the optical properties of ZrO 2 films has been also discussed.
同时讨论了不同沉积温度对ZrO2薄膜光学性质的影响。
参考来源 - 期刊学术社区·2,447,543篇论文数据，部分数据来源于NoteExpress
The deposition temperature can be between room temperature and 100 degrees centigrade.
该沉积温度可以在室温和100摄氏温度之间。
It was shown that the film surface defect density could decreased by applying deposition temperature.
结果表明：通过加温可以降低薄膜的表面粗糙度与缺陷密度大小。
It is the compostiton of bulk material and deposition temperature that mainly affects the diffusion layer.
影响扩散层的主要因素是基体材料的成分和沉积温度；
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